Schott Borofloat 33 Wafers
Schott Borofloat® 33 Wafer is the industry-standard borosilicate glass substrate, manufactured via advanced float process. It features a CTE perfectly matched to silicon (3.25×10⁻⁶/K @20-300℃), exceptional chemical & thermal stability, high optical transmission, and ultra-smooth surface quality. It is the first choice for anodic bonding, MEMS packaging, microfluidics, semiconductor WLP, and industrial optical applications. We supply standard 2"~12" wafers (SSP/DSP) from prototype to high-volume production.
Chemical composition
Schott Borofloat 33 Wafers process capability